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              真空鍍膜PVD二硫化鉬涂層加工

              發布時間:2022-10-08 16:54  

              【廣告】

              性能優勢

              · Coating deposition carried out using a high density of low energy bombarding ions.

              使用高密度低能量轟擊離子進行沉積鍍膜。

              · Deposition of very dense, non-columnar coating structures with low internal stresses.

              鍍層致密度好,低柱狀晶結構,內應力低

              · Deposition of coatings with dense structures at low temperatures.

              ? 可在低溫環境下沉積致密結構的鍍層

              · High efficiency of ion cleaning resulting in coatings with the highest levels of adhesion.

              高效率等離子清理以提供高的鍍層結合強度。

              · Coatings quality is assured by the use of specially designed Plasmag sputter sources, which create an intense plasma and high ion bombardment of work pieces.

              鍍層品質保證是由使用專門設計plasmag濺射源及提供高密度的等離子。